HEAT3-PS

Product Information

The HEAT3-PS is used for resistive heating or electron bombardment heating.

The power supply can also be used for effusion cell evaporators. The unit is equipped with a PID temperature controller.

Ramp heating function control sample temperature to protect sample from damage. Sample overheating can also be protected by setting the voltage and current limits. The unit can be operated in auto mode (with temperature control) or manual mode (without temperature control).

Features

• dual heating mode: resistive and electron bombardment

• wide range temperature measurement (1.4-2473.15K)

• 2D real time chart module

• Shutter Control - up to 2 shutters for double DC module version, 1 shutter per channel (eg. shutters of sources or manipulators)

• high efficiency

• setpoint based over-voltage and over-current output protection

• fully manual or PID temperature controlled (by setpoint and ramp)

• process temperature control with built-in PID controller (with autotuning function for optimized process PID parameters)

• various kind of temperature sensors: thermocouples K/C/E/N (other on request), Pt, diode

• multiple I/O (10 digital/4 analog) - individual reprogrammable

• high resolution (16-bit analog I/O, 0.1 K temp.)

• one vacuum channel for active gauges

• mobile solutions for remote access and control

• customised menu options (for robust and effectivity)

• support (easy firmware update via USB)

• autosave function

Applications

• any thermal process according to the specifications

• effusion cells supply

• sample holders heatings

• thermal monitoring

Options

• second DC module available:

 - two resisting heating zones with independent control, or

 - one resistive heating zone with higher output power (90V, 17A or 45V, 30A)

• software control (Version Pro, Extended or Library Module)

• analog I/O card for vacuum measurement (1 gauge)