incl. VAT, plus shipping

Delivery Time 2 - 3 Weeks

EF 40C1DF Double Filament Effusion Cell is a source with two independently operated filaments for greater convenience in the evaporation process.

Custom insertion length min. 325 mm (other on request). Manufactured by PREVAC



Double Filament Effusion Cell



EF 40C1DF Double Filament Effusion Cell is a source with two independently operated filaments for greater convenience in the evaporation process.

Custom insertion length min. 325 mm (other on request).



·        Dual filament source operation

·        Operation modes: serial, parallel, hot lip, cold lip

·        Extremely stable flux rates

·        Various crucible materials

·        Highly reproducible & reliable

·        Suitable for use in any MBE system

·        Mo free construction (allows high outgassing temperatures)

·        Integral water cooling

·        Thermocouple type C



·        Customised insertion length

·        With or without integrated manual/electro-pneumatic shutter

·        Linear shift

·        Crucibles





The HEAT3-PS is used for resistive heating or electron bombardment heating. The power supply can also be used for effusion cell evaporators. The unit is equipped with a PID temperature controller.

Ramp heating function control sample temperature to protect sample from damage. Sample overheating can also be protected by setting the voltage and current limits. The unit can be operated in auto mode (with temperature control) or manual mode (without temperature control). The unit is equipped with autosave function (the device saves your parameters, pre-set and apply them automatically after restart).



·        Dual heating mode: resistive and electron bombardment

·        Wide range temperature measurement (1.4 - 2473.15 K)

·        2D real time chart module

·        High efficiency

·        Setpoint based over-voltage and over-current output protection

·        Fully manual or PID temperature controlled (by setpoint and ramp)

·        Process temperature control with built-in PID controller (with autotuning function for optimized process PID parameters)

·        Various kind of temperature sensors: thermocouples K/C/

·        E/N (other on request), Pt, diode

·        Multiple I/O (10 digital/4 analog) - individual reprogrammable

·        High resolution (16-bit analog I/O, 0.1 K temp.)

·        One vacuum channel for active gauges

·        Shutter control function - up to 2* shutters (e.g. shutters of sources or manipulators)

·        Mobile solutions for remote access and control

·        Customised menu options (for robust and effectivity)

·        Support (easy firmware update via USB)

*for double DC module version, 1 shutter per channel



·        Second DC module available: two resistive heating zones with independent control, or one resistive heating zone with higher output power (90V, 17A or 45V, 30A) excluding EB module

·        Analog I/O card for vacuum measurement (1 gauge)

Product Details

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EF 40C1DF Double Filament Effusion Cell

Technical data

Mounting flange: DN 40CF (rotatable) 

Heater: W wire (tungsten)

Temperature range: 250 °C - 1400 °C

Temperature stability: ± 0.1°C 

Crucible type (option): PBN, Al2O3, Quartz (other materials on request)

Crucibles volume: 5cc (other volume on request)

Evaporated materials: Group III-V MBE all typical materials (e.g. Ga, In, Al, Si, Be, Cu, Ag, Au, CaF2)

Thermocouple type: type C

Degassing temp.: 1450 °C

Water cooling (required): water flow: > 0.5 l/min, temperature: 15 - 30 °C, max pressure: 6 bar

Insertion length: min. 115 mm (other on request) OD: 35 mm

Spot size: Dependent on working distance

Working distance: 100 - 150 mm

Bakeout temperature: up to 250 °C

Working pressure: < 10-5 mbar




Supply voltage: 100-130VAC/200-260 VAC, 50-60Hz (power consumption max 1600 W) 

Resistive heating (mode parameters): 45 V, 17 A - standard (other versions on request) 

EB heating (mode parameters): 1000 V, 300 mA – standard (other versions on request) 

Temperature range: 273.15 K - 2473.15 K for type C thermocouple (dependent on sample holder type or evaporator); 73.15 K - 1645.15 K for type K thermocouple; 1.4 K – 500 K for DT650/DT470 silicon diodes; (dependent on sample holder type and conditions in chamber) 

Temperature independent inputs: 2 - for thermocouples K/C/E/N; 2 - for silicon diodes DT650/DT470 

Temperature setpoint ramp rate: adjustable from 0.1 K to 1000 K/ s|min|h 

ΔT setpoint:  0.1 to 5.0 K/s 

Vacuum measurement (optional): CTR90, TTR91, TTR211, PTR225, PTR90, ITR90, ITR100, Baratron, ANALOG IN, PG105, MG13/14, PKR251/360/361, PCR280, ATMION 

Communication interface: RS232/485, Ethernet 

Communication protocol: MODBUS-TCP 

User interface: 7” TFT display with touchscreen, digital encoder 

Interface languages: English, German, Polish 

Dimensions: 448.8 x 132.5 x 375 mm (WxHxD), 19” rack mountable 

Weight (approx.): 8.8 kg (for standard version) 



·        Any thermal process according to the specifications 

·        Effusion cells supply 

·        Sample holders heating 

·        Thermal monitoring 


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